Capabilities:
Skilled personnel and sophisticated equipment provide the versatility needed for
assignments that range from small prototype quantities to large production runs. All
facilities are centrally located in a modern, 20,000 square foot building, designed for
efficient performance over a wide range of thin film requirements.
- Electron Beam Evaporation
- R.F. and D.C. Magnetron Sputtering
- Ion Beam Assisted Deposition
- Reactive Sputtering
- Photolithic Patterning
- Gold Electroplating
- Substrate Diamond Sawing
- Stylus Profilometer and Spectrophotometer Measurement of Thin Films
- Complete Machine Shop For Custom Tooling
- Prototype R&D/High Volume Production
- Compliance With Mil Specs
Applications:
- Metallized Ceramic, Metal, Plastic, and Glass Substrates
- Electronically Conductive Transparent Coatings
- Optical Coatings/Lasers/Electro-Optical Coatings
- Microwave Hybrid Conductor/Resistor Circuits
- Conductive Sputtered & Plated-Through Via Holes in Substrates
- Thin Film Thickness and Optical Standards
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